Wet cleaning technology for wafers

Wet cleaning technology for wafers

Wet cleaning process is a process that uses chemical treatment, gas, and physical means to remove impurities from the surface of wafers. By promoting chemical reactions between impurities and solvents, soluble substances, gases, or direct exfoliation are generated to achieve cleaning goals.

With the continuous reduction of nanoscale in chip manufacturing processes, the requirements for semiconductor wet cleaning technology are becoming increasingly stringent. In the overall process of semiconductor manufacturing, cleaning technology accounts for about 30% of the important proportion.

Difficulties in the control system of wafer wet cleaning equipment:

1. Multi point temperature control

2. Multi axis motion control

3. Multiple parallel communication buses

4. Data tracking and analysis

5. Standardized management of software versions

6. Stability of control system

7. Functions and performance of the controller

Control system architecture:

Characteristics of SINSEGYE's solution:

For the control requirements of wet wafer cleaning equipment, SINOGYE's solution has the following characteristics:

• Integrated Control and Computation

• Easy-to-use & Strong scalability

 
1. Integrated Control and Computation

-A SP7000H iComputer replaces the original upper level industrial control computer+PLC, reducing hardware equipment and lowering costs by about 30%.

-The data communication between the upper software and the soft PLC is effectively improved through shared memory or ACP, which enhances the speed of data exchange.

-Using virtualization technology, Windows blue screen or restart does not affect the running of real-time tasks.

2. Easy-to-use & Strong scalability

-Rich communication protocols. Supports multiple industrial communication protocols such as DeviceNet, EtherCAT, EtherNet/IP, Modbus, OPC UA, etc. Facilitate the expansion of system structure and integration with upper level systems.

-Support development language programming defined by IEC61131-3 standard.

-The embedded rich feature library greatly improves programming efficiency.

-Provide a visual programming environment to shorten the development cycle of customer projects.

-Data Analysis: Provides DataScope oscilloscope software for displaying and analyzing variables in automated systems in a graphical manner. Greatly convenient for customers to analyze various application requirements.

-IO version management: For various IO brands and different slave stations, IO version management functions can be provided, allowing customers to easily manage multiple models with the same program. Support EtherCAT and DeviceNet slave management