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ALD atomic deposition system

Application

ALD atomic deposition system

2024-11-15

Atomic layer deposition technology

Atomic layer deposition (ALD) is a thin film preparation technique that grows layer by layer at the atomic level. The ideal ALD growth process involves selectively alternating and exposing different precursors to the surface of the substrate, where they chemically adsorb and react to form deposited thin films.

A complete ALD growth cycle can be divided into four steps:

1. The first precursor of the pulse is exposed on the surface of the substrate, while the first precursor is chemically adsorbed on the surface of the substrate

2. Inert carrier gas blows away the remaining unreacted precursor

3. The second precursor of the pulse undergoes a chemical reaction on the surface to obtain the desired thin film material

4. Inert carrier gas blows away the remaining precursors and reaction by-products

 

Difficulties in the control system of dual cavity ALD atomic deposition system:

1. Multi point temperature control

2. Multiple communication buses connect different slave stations

3. Data tracking and analysis

4. Software standardization management

5. There are high requirements for the performance, functionality, and size of the controller

 

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Control system architecture:

 

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Characteristics of SINSEGYE's solution:

 

1. Integrated Control and Computation


-An iComputer replaces the customer's original industrial control computer and imported PLC, reducing the size of the control cabinet while saving more than 50% of costs.

-The PC architecture controller has powerful performance and, when combined with the EtherCAT bus, can effectively improve control performance.

 

2. Easy-to-use & Strong scalability

 

-Communication Protocol: This system integrates diverse industrial communication protocols, including DeviceNet, EtherCAT, EtherNet/IP, Modbus RTU, Modbus TCP, OPC UA, and self-developed ACP communication protocols, facilitate the expansion of system structure and integration with upper level systems.

-Network architecture: Supports EtherCAT ring network redundancy, improves communication stability of EtherCAT network, and enhances device stability.

-Data Analysis: Provides DataScope oscilloscope software for displaying and analyzing variables in automated systems in a graphical manner. Greatly convenient for customers to analyze various application requirements.

-IO version management: For various IO brands and different slave stations, IO version management functions can be provided, allowing customers to easily manage multiple models with the same program.