Application

Thin film deposition equipment is mainly responsible for the deposition of dielectric and metal layers in various process steps, including CVD (chemical vapor deposition), PVD (physical vapor deposition), and ALD (atomic layer deposition), among which ALD belongs to the branch of CVD. According to different deposition processes, thin film ......

Atomic layer deposition (ALD) is a thin film preparation technique that grows layer by layer at the atomic level. The ideal ALD growth process involves selectively alternating and exposing different precursors to the surface of the substrate, where they chemically adsorb and react to form deposited thin films.A complete ALD growth cycle can be ......

Wet cleaning process is a process that uses chemical treatment, gas, and physical means to remove impurities from the surface of wafers. By promoting chemical reactions between impurities and solvents, soluble substances, gases, or direct exfoliation are generated to achieve cleaning goals.With the continuous reduction of nanoscale in ......